State creation induced by gate bias stress in unhydrogenated polysilicon TFTs

Author: Tala-Ighil B.   Rahal A.   Mourgues K.   Toutah A.   Pichon L.   Mohammed-Brahim T.   Raoult F.   Bonnaud O.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.337, Iss.1, 1999-01, pp. : 101-104

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