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Taylor & Francis Ltd

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Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

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Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition

By Huran J.   Safrankova J.   Kobzev A.P.  

Vacuum, Vol. 50, Iss. 1, 1998-05 ,pp. : 103-105

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Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition

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Chemical vapour deposition and characterization of gallium oxide thin films

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