Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD

Author： Yoon S.F.   Rusli   Ahn J.   Zhang Q.   Yang C.Y.   Yang H.   Watt F.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.340, Iss.1, 1999-02, pp. : 62-67

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

The effect of microwave power on the deposition of boron-doped a-SiC:H films using the electron cyclotron resonance method

By Yoon S.F.   Ji R.   Ahn J.   Milne W.I.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 155-159

Elsevier

Access to resources Recommend Favorite

Preparation of a-C and DLC-C films using electron cyclotron resonance CVD and RF bias

By Yoon S.F.   Yang H.   Zhang Q.   Ahn R.J.  

Vacuum, Vol. 49, Iss. 1, 1998-01 ,pp. : 67-74

Elsevier

Access to resources Recommend Favorite

Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma

By Yoon S.F.   Ruslie   Ahn J.   Zhang Q.   Wu Y.S.   Yang H.  

Vacuum, Vol. 51, Iss. 3, 1998-11 ,pp. : 445-451

Elsevier

Access to resources Recommend Favorite

Mechanical, electrical and optical properties of a-C:H:N films deposited by plasma CVD technique

By Chakrabarti K.   Basu M.   Chaudhuri S.   Pal A.K.   Hanzawa H.  

Vacuum, Vol. 53, Iss. 3, 1999-06 ,pp. : 405-413

Elsevier

Access to resources Recommend Favorite

Dielectric properties of molybdenum-containing diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

By Huang Q.F.   Yoon S.F.   Rusli   Zhang Q.   Ahn J.  

Thin Solid Films, Vol. 409, Iss. 2, 2002-04 ,pp. : 211-219

Elsevier

Access to resources Recommend Favorite