Relations between the optical properties and the microstructure of TiO 2 thin films prepared by ion-assisted deposition

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A comparative study of the UV optical and structural properties of SiO 2 , Al 2 O 3 , and HfO 2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

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Optical and crystallisation behaviour of TiO 2 and V/TiO 2 thin films prepared by plasma and ion beam assisted methods

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Thin Solid Films, Vol. 429, Iss. 1, 2003-04 ,pp. : 84-90

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Ion beam-assisted deposition of MgF 2 and YbF 3 films

By Kennedy M.   Ristau D.   Niederwald H.S.  

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Properties of TiO 2 films prepared by ion-assisted deposition using a gridless end-Hall ion source

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