Electronic properties of MOS capacitor exposed to inductively coupled hydrogen plasma

Author： Ikeda A.   Sadou T.   Nagashima H.   Kouno K.   Yoshikawa N.   Tshukamoto K.   Kuroki Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.345, Iss.1, 1999-05, pp. : 172-177

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