Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films 1

Author： Kaltofen R. Sebald T. Schulte J. Weise G.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.347, Iss.1, 1999-06, pp. : 31-38

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