Relations between the optical properties and the microstructure of TiO 2 thin films prepared by ion-assisted deposition

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Thin Solid Films, Vol. 359, Iss. 2, 2000-01 ,pp. : 171-176

Elsevier

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A comparative study of the UV optical and structural properties of SiO 2 , Al 2 O 3 , and HfO 2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition

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Properties of TiO 2 films prepared by ion-assisted deposition using a gridless end-Hall ion source

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Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. : 84-89

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Study of HfO 2 films prepared by ion-assisted deposition using a gridless end-hall ion source

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The characterization of undoped SnO x thin film grown by reactive ion-assisted deposition

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