Author: Lange T. Njoroge W. Weis H. Beckers M. Wuttig M.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.365, Iss.1, 2000-04, pp. : 82-89
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering
By Hotovy I. Huran J. Janik J. Kobzev A.P.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
Dielectric properties of TiO 2 thin films deposited by a DC magnetron sputtering system
By Stamate M.D.
Thin Solid Films, Vol. 372, Iss. 1, 2000-09 ,pp. :
Properties of SnO 2 films prepared by DC and MF reactive sputtering
By Ruske M. Brauer G. Pistner J. Pfafflin U. Szczyrbowski J.
Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. :