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Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films 1

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Structure and optical properties of Si incorporated diamond-like carbon films deposited by r.f. plasma-assisted chemical vapor deposition

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Crystallinity, morphology and microstructure of chemical-vapor-deposited carbon films on different substrates

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Thin Solid Films, Vol. 261, Iss. 1, 1995-06 ,pp. : 52-58

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Structure, composition and tribological properties of carbon nitride films

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