Infrared absorption spectroscopy measurements of amorphous CN x films prepared in CH 4 /N 2 r.f. discharge

By Mutsukura N.   Akita K.-i.  

Thin Solid Films, Vol. 349, Iss. 1, 1999-07 ,pp. : 115-119

Elsevier

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The effect of oxygen rf discharge on pulsed laser deposition of oxide films

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Chemical bonding in thin Ge/C films deposited from tetraethylgermanium in an r.f. glow discharge - An FTIR study

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Roughness and deposition mechanism of DLC films prepared by r.f. plasma glow discharge

By Ali A.   Hirakuri K.K.   Friedbacher G.  

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Hydrophobic CN x thin film growth by inductively-coupled RF plasma enhanced pulsed laser deposition

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