Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

By Chattopadhyay K.K.   Matsumoto S.   Zhang Y.-F.   Sakaguchi I.   Nishitani-Gamo M.   Ando T.  

Thin Solid Films, Vol. 354, Iss. 1, 1999-10 ,pp. : 24-28

Elsevier

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Coplanar amorphous silicon thin film transistor fabricated by inductively-coupled plasma CVD

By Ki Kim S.   Il Cho S.   Jin Choi Y.   Sik Cho K.   Pietruszko S.M.   Jang J.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 200-202

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Growth of In x Ga 1-x N thin films on indium tin oxide/glass substrates by RF plasma enhanced chemical vapor deposition

By Park D.-C.   Ko H.-C.   Fujita S.   Fujita S.  

Thin Solid Films, Vol. 338, Iss. 1, 1999-01 ,pp. : 9-12

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Deposition of fine carbon particles using pulsed ArF laser ablation assisted by inductively coupled plasma

By Suda Y.   Nishimura T.   Ono T.   Akazawa M.   Sakai Y.   Homma N.  

Thin Solid Films, Vol. 374, Iss. 2, 2000-10 ,pp. : 287-290

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Effects of heat treatment on structure of amorphous CN x thin films by pulsed laser deposition

By Aoi Y.   Ono K.   Sakurada K.   Kamijo E.   Sasaki M.   Sakayama K.  

Thin Solid Films, Vol. 389, Iss. 1, 2001-06 ,pp. : 62-67

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