Microstructure and growth modes of stoichiometric NiAl and Ni 3 Al thin films deposited by r.f.-magnetron sputtering

Author: de Almeida P.   Schaublin R.   Almazouzi A.   Victoria M.   Levy F.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.368, Iss.1, 2000-06, pp. : 26-34

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Abstract