Formation of ultra-shallow junctions using epitaxial CoSi 2 thin film as diffusion sources

By Bae K.S.   Kim J.R.   Hong S.Y.   Park Y.B.   Cho Y.S.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 260-265

Elsevier

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Growth of patterned thin epitaxial CoSi 2 -films by a titanium oxide mediated epitaxy process

By Kluth P.   Detavernier C.   Zhao Q.-T.   Xu J.   Bochem H.-P.   Lenk S.   Mantl S.  

Thin Solid Films, Vol. 380, Iss. 1, 2000-12 ,pp. : 201-203

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Self-ordering of CoSi 2 precipitates and epitaxial layer growth of CoSi 2 on Si(100)

By Mantl S.   Hacke M.   Bay H.L.   Kappius L.   Mesters S.  

Thin Solid Films, Vol. 321, Iss. 1, 1998-05 ,pp. : 251-255

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The growth of an intermediate CoSi phase during the formation of epitaxial CoSi 2 by solid phase reaction

By Falke M.   Gebhardt B.   Beddies G.   Teichert S.   Hinneberg H.-J.  

Thin Solid Films, Vol. 336, Iss. 1, 1998-12 ,pp. : 201-204

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Comparison of epitaxial growth of CoSi 2 among Co/Ti, Co/Hf, and Co/Nb bilayers on (100)Si

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Thin Solid Films, Vol. 380, Iss. 1, 2000-12 ,pp. : 127-129

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