Effect of annealing on the structural and electrical properties of d.c. multipolar plasma deposited a-C:H films

Author: Clin M.   Benlahsen M.   Zeinert A.   Zellama K.   Naud C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.372, Iss.1, 2000-09, pp. : 60-69

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Abstract