Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced chemical vapour deposition

By Benmassaoud A.A.   Paynter R.W.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 125-129

Elsevier

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Synthesis of Sn-doped a-C:H films by RF plasma-enhanced chemical vapor deposition and their characterization

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Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 41-45

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Room-temperature deposition of a-SiC:H thin films by ion-assisted plasma-enhanced CVD

By Lee Y.H.   Kim D.S.  

Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. : 109-118

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Preparation of ultra water-repellent films by microwave plasma-enhanced CVD

By Hozumi A.   Takai O.  

Thin Solid Films, Vol. 303, Iss. 1, 1997-07 ,pp. : 222-225

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Properties of silicon oxide films deposited by plasma-enhanced CVD using organosilicon reactants and mass analysis in plasma

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Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 47-51

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