Radical kinetics for polymer film deposition in fluorocarbon (C 4 F 8 , C 3 F 6 and C 5 F 8 ) plasmas

Author: Takahashi K.   Itoh A.   Nakamura T.   Tachibana K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.374, Iss.2, 2000-10, pp. : 303-310

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Abstract