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Elsevier

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Inductively coupled plasma etching of SiO 2 layers for planar lightwave circuits

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High rate sapphire (Al 2 O 3 ) etching in inductively coupled plasmas using axial external magnetic field

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Etch-induced damage in single crystal Si trench etching by planar inductively coupled Cl 2 /N 2 and Cl 2 /HBr plasmas

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