![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Tazawa M. Jin P. Miki T. Yoshimura K. Igrashi K. Tanemura S.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.375, Iss.1, 2000-10, pp. : 100-103
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Physical properties of plasma deposited SiO x thin films
By San Andres E. del Prado A. Martil I. Gonzalez G. Martnez F.L. Bravo D. Lopez F.J. Fernandez M.
Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Ion-beam sputtering of (Ta 2 O 5 ) x -(SiO 2 ) 1-x composite thin films
By Cevro M.
Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
SrRu 1-x Fe x O 3 films coated with SiO 2 nano-particles
By Park J.-C. Kim I.-G. Kim D. Lee C.-S.
Thin Solid Films, Vol. 441, Iss. 1, 2003-09 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
By Horita S. Horii S. Nakajima H. Umemoto S.
Thin Solid Films, Vol. 388, Iss. 1, 2001-06 ,pp. :