Influence of Si(100) surface pretreatment on the morphology of TiO 2 films grown by atomic layer deposition

By Finnie K.S.   Triani G.   Short K.T.   Mitchell D.R.G.   Attard D.J.   Bartlett J.R.   Barbe C.J.  

Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. : 109-116

Elsevier

Access to resources Recommend Favorite

Surface morphology study and electrical properties of Si 1-x C x on Si grown by low pressure chemical vapor deposition

By He L.   Shi Z.Q.   Jiang N.   Han P.   Zheng Y.D.  

Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. : 15-17

Elsevier

Access to resources Recommend Favorite

Pulsed laser deposition of Co and growth of CoSi 2 on Si(111)

By Löffler M.   Cordón J.   Weinelt M.   Ortega J.E.   Fauster T.  

Applied Physics A, Vol. 81, Iss. 8, 2005-12 ,pp. : 1651-1655

Springer Publishing Company

Access to resources Recommend Favorite

Growth of -FeSi 2 and FeSi layers by reactive deposition using Sb-related intermetallic compounds

By Koga T.   Bright  

Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. : 248-252

Elsevier

Access to resources Recommend Favorite

Atomistic Study of the Copper Cluster Deposition on Si(001) and Si(111) Surface

By  

Materials Science Forum, Vol. 2016, Iss. 850, 2016-04 ,pp. : 287-298

Trans Tech Publications

Access to resources Recommend Favorite