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Deposition and characterisation of silicon grown in a SiF 4 /SiH 4 /H 2 mixture for TFT applications

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Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH 4 , SiF 4 and O 2

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Structural and electrical properties of low temperature polycrystalline silicon deposited using SiF 4 -SiH 4 -H 2

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