Preparation and characterization of smooth and dense silicon nitride thin films

By Xu W.   Fujimoto T.   Kojima I.  

Thin Solid Films, Vol. 394, Iss. 1, 2001-08 ,pp. : 108-113

Elsevier

Access to resources Recommend Favorite

Compositional characterization of silicon nitride thin films prepared by RF-sputtering

By Vila M.   Martn-Gago J.A.   Munoz-Martn A.   Prieto C.   Miranzo P.   Osendi M.I.   Garca-Lopez J.   Respaldiza M.A.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 513-518

Elsevier

Access to resources Recommend Favorite

Transient wear of silicon nitride in lubricated rolling contact

By Chao L.   Lakshminarayanan R.   Iyer N.   Lin G.   Shetty D.K.  

Wear, Vol. 223, Iss. 1, 1998-12 ,pp. : 58-65

Elsevier

Access to resources Recommend Favorite

Synthesis, Characterization, and Thermal Properties of Chlorine‐Containing 1,1,2,2‐Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films

By  

EUROPEAN JOURNAL OF INORGANIC CHEMISTRY (ELECTRONIC), Vol. 2015, Iss. 19, 2015-07 ,pp. : 3205-3211

John Wiley & Sons Inc

Access to resources Recommend Favorite

High rate deposition of silicon nitride films by APCVD

By Otani T.   Hirata M.  

Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. : 44-47

Elsevier

Access to resources Recommend Favorite