Surface reaction processes in C 4 F 8 and C 5 F 8 plasmas for selective etching of SiO 2 over photo-resist

Author: Motomura H.   Imai S.-i.   Tachibana K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.390, Iss.1, 2001-06, pp. : 134-138

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Abstract