Steady-state direct-current plasma immersion ion implantation using an electron cyclotron resonance plasma source

Author: Zeng X.   Chu P.K.   Chen Q.   Tong H.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.390, Iss.1, 2001-06, pp. : 145-148

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Abstract