High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

Author： Morrison N.A. Rodil S.E. Ferrari A.C. Robertson J. Milne W.I.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.337, Iss.1, 1999-01, pp. : 71-73

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