Problems of hydrogen high‐temperature activation by chemical vapor deposition of diamond films

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 12, Iss. 7, 2015-07 ,pp. : 886-890

John Wiley & Sons Inc

Access to resources Recommend Favorite

Low-temperature atmospheric-pressure metal-organic chemical vapor deposition of molybdenum nitride thin films

By Fix R.   Gordon R.G.   Hoffman D.M.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 116-119

Elsevier

Access to resources Recommend Favorite

Epitaxial growth of ZnO thin films exhibiting room-temperature ultraviolet emission by atmospheric pressure chemical vapor deposition

By Kaiya K.   Omichi K.   Takahashi N.   Nakamura T.   Okamoto S.   Yamamoto H.  

Thin Solid Films, Vol. 409, Iss. 1, 2002-04 ,pp. : 116-119

Elsevier

Access to resources Recommend Favorite

High mobility -SiC epilayer prepared by low-pressure rapid thermal chemical vapor deposition on a (100) silicon substrate

By Hwang J.D.   Fang Y.K.   Song Y.J.   Yaung D.N.  

Thin Solid Films, Vol. 272, Iss. 1, 1996-01 ,pp. : 4-6

Elsevier

Access to resources Recommend Favorite

Composite chemical vapor deposition diamond anvils for high-pressure/high-temperature experiments

By Zha Chang-Sheng   Krasnicki Szczesny   Meng Yu-Fei   Yan Chih-Shiue   Lai Joseph   Liang Qi   Mao Ho-Kwang   Hemley Russell  

International Journal of High Pressure Research, Vol. 29, Iss. 2, 2009-06 ,pp. : 317-324

Taylor & Francis Ltd

Access to resources Recommend Favorite