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Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 18-24

Elsevier

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The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 17-24

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Solid-phase crystallization of hydrogenated amorphous silicon/hydrogenated microcrystalline silicon bilayers deposited by plasma-enhanced chemical vapor deposition

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Effect of the hydrogen flow rate on the structural and optical properties of hydrogenated amorphous silicon thin films prepared by plasma enhanced chemical vapor deposition

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John Wiley & Sons Inc

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Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

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