Residual stress states in sputtered Ti 1-x Si x N y films

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Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. : 195-202

Elsevier

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In x O y N z films with a Ta 2 O 5 promoter for the detection of CO, H 2 , and CH 4

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Microstructure of Ta 2 O 5 films grown by the anodization of TaN x

By Werder D.J.   Kola R.R.  

Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. : 6-9

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LiNb 1-x Ta x O 3 films prepared by thermal plasma spray CVD

By Yamamoto H.   Kulinich S.A.   Terashima K.  

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Research on the thermal expansion behavior of anodic films on aluminium

By Zhou J.   Wu J.   Yang Y.  

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