Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

By Baa I.   Fernandes B.   Nunes P.   Quintela M.   Martins R.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 244-247

Elsevier

Access to resources Recommend Favorite

Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures

By Meng L.-J.   Dos Santos M.P.  

Thin Solid Films, Vol. 303, Iss. 1, 1997-07 ,pp. : 151-155

Elsevier

Access to resources Recommend Favorite

Performances exhibited by large area ITO layers produced by r.f. magnetron sputtering

By Baa I.   Quintela M.   Mendes L.   Nunes P.   Martins R.  

Thin Solid Films, Vol. 337, Iss. 1, 1999-01 ,pp. : 171-175

Elsevier

Access to resources Recommend Favorite

Synthesis and tailoring of GaN nanocrystals at room temperature by RF magnetron sputtering

By Devaraju G.   Pathak A. P.   Srinivasa Rao N.   Saikiran V.   Nageswara Rao S. V.S.   Titov A. I.  

Radiation Effects and Defects in Solids, Vol. 167, Iss. 9, 2012-09 ,pp. : 659-665

Taylor & Francis Ltd

Access to resources Recommend Favorite

Influence of the deposition pressure on the properties of transparent and conductive ZnO:Ga thin-film produced by r.f. sputtering at room temperature

By Assuncao V.   Fortunato E.   Marques A.   Aguas H.   Ferreira I.   Costa M.E.V.   Martins R.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 401-405

Elsevier

Access to resources Recommend Favorite