Pulsed laser deposition of ilmenite FeTiO 3 epitaxial thin film onto sapphire substrate

By Dai Z.   Zhu P.   Yamamoto S.   Miyashita A.   Narum K.   Naramoto H.  

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 114-116

Elsevier

Access to resources Recommend Favorite

A surface cleaning method for sputter deposition of pure titanium film onto TiNi shape memory alloy substrate

By Sonoda T.   Watazu A.   Zhu J.   Kamiya A.   Ushiki K.   Naganuma K.   Kato M.  

Vacuum, Vol. 60, Iss. 1, 2001-01 ,pp. : 197-199

Elsevier

Access to resources Recommend Favorite

Deposition of Fluorine‐Containing Thin Film by Atmospheric Pressure Plasma Jet and Film Surface Structural Transition

By  

PLASMA PROCESSES AND POLYMERS (ELECTRONIC), Vol. 12, Iss. 4, 2015-04 ,pp. : 362-371

John Wiley & Sons Inc

Access to resources Recommend Favorite

Thin film deposition by reactive magnetron sputtering: On the influence of target oxidation and its effect on surface properties

By Rohde D.   Kersten H.   Hippler R.   Eggs C.  

Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. : 164-171

Elsevier

Access to resources Recommend Favorite

Influence of the substrate temperature and deposition flux in the growth of a Bi thin film on the ten-fold decagonal Al-Ni-Co surface

By Sharma H. R.  

Philosophical Magazine, Vol. 91, Iss. 19-21, 2011-07 ,pp. : 2870-2878

Taylor & Francis Ltd

Access to resources Recommend Favorite