High deposition rate of epitaxial (100) Iridium film on (100)YSZ/(100)Si substrate by RF sputtering deposition

Author: Khoa T.D.   Horii S.   Horita S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 88-94

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Abstract