Thin films of iron oxide by low pressure MOCVD using a novel precursor: tris(t-butyl-3-oxo-butanoato)iron(III)

Author： Shalini K.   Subbanna G.N.   Chandrasekaran S.   Shivashankar S.A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.424, Iss.1, 2003-01, pp. : 56-60

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films

By Gauthier V.   Bourgeois S.   Sibillot P.   Maglione M.   Sacilotti M.  

Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. : 175-182

Elsevier

Access to resources Recommend Favorite

MOCVD growth of Pt films using a novel Pt(IV) compound as a precursor

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 12, Iss. 7, 2015-07 ,pp. : 1053-1059

John Wiley & Sons Inc

Access to resources Recommend Favorite

Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol‐Assisted CVD

By  

CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol. 21, Iss. 1-2-3, 2015-03 ,pp. : 21-25

John Wiley & Sons Inc

Access to resources Recommend Favorite

Iron-iron oxide composite thin films prepared by chemical vapor deposition from iron pentacarbonyl

By Maruyama T.   Shinyashiki Y.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 203-206

Elsevier

Access to resources Recommend Favorite

Microstructural characterization of iron thin films prepared by sputtering at very low temperatures

By Munoz-Martn A.   Vila M.   Prieto C.   Ocal C.   Martnez J.L.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 583-588

Elsevier

Access to resources Recommend Favorite