Author: Xu G. Jin P. Tazawa M. Yoshimura K.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.425, Iss.1, 2003-02, pp. : 196-202
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Characteristics of ZnO thin films deposited onto Al/Si substrates by r.f. magnetron sputtering
By Ki H.Y. Choi J.-W. Lee D.-H.
Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. :
Performances presented by zinc oxide thin films deposited by r.f. magnetron sputtering
By Nunes P. Costa D. Fortunato E. Martins R.
Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. :
Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering
By McClure J.C. Joshi R.N. Singh V.P.
Thin Solid Films, Vol. 257, Iss. 1, 1995-02 ,pp. :