Author: Zudans I. Seliskar C.J. Heineman W.R.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.426, Iss.1, 2003-02, pp. : 238-245
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Reactive ion etching of indium tin oxide by SiCl 4 -based plasmas-substrate temperature effect
By Kuo Y.
Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. :
In situ measurements of ultrathin silicon oxide dissolution rates
Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. :