Diffusion-modified boride interlayers for chemical vapour deposition of low-residual-stress diamond films on steel substrates

Author: Buijnsters J.G.   Shankar P.   Gopalakrishnan P.   van Enckevort W.J.P.   Schermer J.J.   Ramakrishnan S.S.   ter Meulen J.J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.426, Iss.1, 2003-02, pp. : 85-93

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Abstract