Non-destructive probing of interfacial oxidation and nitridation states at RTP Si-oxides

Author： Hoffmann P.   Schmeiszer D.   Roters G.   Nenyei Z.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.428, Iss.1, 2003-03, pp. : 216-222

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