Development of an optical model for steady state porous anodic films on aluminium formed in phosphoric acid

By De Laet J.   Terryn H.   Vereecken J.  

Thin Solid Films, Vol. 320, Iss. 2, 1998-05 ,pp. : 241-252

Elsevier

Access to resources Recommend Favorite

Structures of tantalum pentoxide thin films formed by reactive sputtering of Ta metal

By Chang P.-H.   Liu H.-Y.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 56-63

Elsevier

Access to resources Recommend Favorite

Dielectric properties of TiO 2 thin films deposited by a DC magnetron sputtering system

By Stamate M.D.  

Thin Solid Films, Vol. 372, Iss. 1, 2000-09 ,pp. : 246-249

Elsevier

Access to resources Recommend Favorite

Elaboration, characterization and dielectric properties study of amorphous alumina thin films deposited by r.f. magnetron sputtering

By Segda B.G.   Jacquet M.   Besse J.P.  

Vacuum, Vol. 62, Iss. 1, 2001-05 ,pp. : 27-38

Elsevier

Access to resources Recommend Favorite

Yttrium sesquioxide, Y 2 O 3 , thin films deposited on Si by ion beam sputtering: microstructure and dielectric properties

By Gaboriaud R.J.   Pailloux F.   Guerin P.   Paumier F.  

Thin Solid Films, Vol. 400, Iss. 1, 2001-12 ,pp. : 106-110

Elsevier

Access to resources Recommend Favorite