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By Pelleg J.  

Thin Solid Films, Vol. 325, Iss. 1, 1998-07 ,pp. : 60-71

Elsevier

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Diffusion pattern in MSi₂ and M₅Si₃ silicides in group VB (M = V, Nb, Ta) and VIB (M = Mo, W) refractory metal-silicon systems

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Silicide formation in cobalt/amorphous silicon, amorphous Co-Si and bias-induced Co-Si films

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Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 31-39

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The formation of sputtered Ta/a-Si and a-Si/Ta interfaces in a-Si/Ta/a-Si/c-Si structure

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Influence of ion implantation induced defects on formation of buried CoSi 2 structures in Si(100)

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