Comparison of the removal efficiency for organic contaminants on silicon wafers stored in plastic boxes between UV/O 3 and ECR oxygen plasma cleaning methods

Author： Choi K.   Eom T.-J.   Lee C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 227-231

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