Electrophysical properties of thin germanium/carbon layers produced on silicon using organometallic radio frequency plasma enhanced chemical vapor deposition process

Author： Szmidt J.   Gazicki-Lipman M.   Szymanowski H.   Mazurczyk R.   Werbowy A.   Kudla A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.441, Iss.1, 2003-09, pp. : 192-199

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