Comparison of hafnium silicate thin films on silicon (100) deposited using thermal and plasma enhanced metal organic chemical vapor deposition

Author: Rangarajan V.   Bhandari H.   Klein T.M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 1-4

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