Comparison of hafnium silicate thin films on silicon (100) deposited using thermal and plasma enhanced metal organic chemical vapor deposition

Author： Rangarajan V.   Bhandari H.   Klein T.M.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 1-4

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