Preparation of sub-nanometer thickness-controlled tin dioxide films by pulsed atomic-layer CVD

Author： Takeuchi T.   Shoji K.   Tadano T.   Doteshita I.   Onodera S.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.442, Iss.1, 2003-10, pp. : 98-101

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