Phase formation and microstructure of Nb 1-x Al x N alloy films grown on MgO (001) by reactive sputtering: A new ternary phase

Author： Selinder T.I. Miller D.J. Gray K.E. Sardela M.R.J. Hultman L.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.46, Iss.12, 1995-12, pp. : 1401-1406

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Phase composition and microstructure of polycrystalline and epitaxial TaN x layers grown on oxidized Si(001) and MgO(001) by reactive magnetron sputter deposition

By Shin C.-S. Kim Y.-W. Gall D. Greene J.E. Petrov I.

Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. : 172-182

Elsevier

Access to resources Recommend Favorite

By Thielsch R. Kaemmer K. Holzapfel B. Schultz L.

Thin Solid Films, Vol. 301, Iss. 1, 1997-06 ,pp. : 203-210

Elsevier

Access to resources Recommend Favorite

Oxidation behavior of (Ti 1-x Al( x ))N films prepared by r.f. reactive sputtering

By Inoue S. Uchida H. Koterazawa K. Yoshinaga Y.

Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. : 171-176

Elsevier

Access to resources Recommend Favorite

Formation of thin TiN x O y films by using a hollow cathode reactive DC sputtering system

By Kazemeini M.H. Berezin A.A. Fukuhara N.

Thin Solid Films, Vol. 372, Iss. 1, 2000-09 ,pp. : 70-77

Elsevier

Access to resources Recommend Favorite

Electron microscopy analysis of the microstructure of Ti 1-x Al x N alloy thin films prepared using a chemical vapour deposition method

By Ikeda S. Gilles S. Chenevier B.

Thin Solid Films, Vol. 315, Iss. 1, 1998-03 ,pp. : 257-262

Elsevier

Access to resources Recommend Favorite