X-ray reflectivity analysis of thin TiN and TiO x N y films deposited by dual-ion-beam sputtering on (100)Si substrates

By Alvisi M.   Rizzo A.   Tapfer L.   Vasanelli L.  

Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. : 130-134

Elsevier

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Study of reactive DC magnetron sputtering deposition of AlN thin films

By Dechev D.A.   Dimitrova V.I.   Manova D.I.  

Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. : 193-197

Elsevier

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Electron microscopy characterization of TiN films on Si, grown by d.c. reactive magnetron sputtering

By Pecz B.   Frangis N.   Logothetidis S.   Alexandrou I.   Barna P.B.   Stoemenos J.  

Thin Solid Films, Vol. 268, Iss. 1, 1995-11 ,pp. : 57-63

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Preparation of TiN x thin films using r.f.-d.c. coupled magnetron sputtering in Ar-N 2 gas plasma

By Tanaka T.   Kawabata K.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 93-95

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Dielectric properties of TiO 2 thin films deposited by a DC magnetron sputtering system

By Stamate M.D.  

Thin Solid Films, Vol. 372, Iss. 1, 2000-09 ,pp. : 246-249

Elsevier

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