Control of high-density plasma sources for CVD and etching

Author： Suzuki K.   Sugai H.   Nakamura K.   Ahn T.H.   Nagatsu M.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.48, Iss.7, 1997-09, pp. : 659-664

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