Detection of CH 3 radicals in an RF CH 4 /H 2 plasma by photoionization mass spectrometry

Author: Ando S.   Shinohara M.   Takayama K.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.49, Iss.2, 1998-02, pp. : 113-120

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