Mechanical, electrical and optical properties of a-C:H:N films deposited by plasma CVD technique

By Chakrabarti K.   Basu M.   Chaudhuri S.   Pal A.K.   Hanzawa H.  

Vacuum, Vol. 53, Iss. 3, 1999-06 ,pp. : 405-413

Elsevier

Access to resources Recommend Favorite

Synthesis, Spectral Characterization of Four Symmetrical and Unsymmetrical Organotellurium(II) Compounds: O−H…N, CH…π, and CH…O Secondary Interactions in X‐Ray Crystal Structures of 4‐MeOC6H4TeCH2CH2CH2N═C(CH3)C6H4‐2‐OH (1) and Te[CH2CH2CH2N═C(CH3)C6H4‐2‐OH]2 (2)

By  

HETEROATOM CHEMISTRY (ELECTRONIC), Vol. 26, Iss. 5, 2015-09 ,pp. : 313-321

John Wiley & Sons Inc

Access to resources Recommend Favorite

Structure changes in a-C:H films in inductive CH 4 /Ar plasma deposition

By Teii K.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 103-107

Elsevier

Access to resources Recommend Favorite

Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD

By Yoon S.F.   Rusli   Ahn J.   Zhang Q.   Yang C.Y.   Yang H.   Watt F.  

Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. : 62-67

Elsevier

Access to resources Recommend Favorite

Dust particle formation in low pressure Ar/CH 4 and Ar/C 2 H 2 discharges used for thin film deposition

By Berndt J.   Hong S.   Kovacevic E.   Stefanovic I.   Winter J.  

Vacuum, Vol. 71, Iss. 3, 2003-05 ,pp. : 377-390

Elsevier

Access to resources Recommend Favorite