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Taylor & Francis Ltd

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Ion-beam processing of hydrogenated amorphous silicon carbide grown by plasma-enhanced chemical vapour deposition

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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition

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Characterization of hydrogenated amorphous carbon films produced by plasma-enhanced chemical vapour deposition with various chemical hybridizations

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Elsevier

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Effect of the hydrogen flow rate on the structural and optical properties of hydrogenated amorphous silicon thin films prepared by plasma enhanced chemical vapor deposition

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John Wiley & Sons Inc

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