Characterization of hydrogenated amorphous carbon films produced by plasma-enhanced chemical vapour deposition with various chemical hybridizations

By Bourgoin D.   Turgeon S.   Ross G.G.  

Thin Solid Films, Vol. 357, Iss. 2, 1999-12 ,pp. : 246-253

Elsevier

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Comparison of Si 1-y C y films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition

By McNeill D.W.   Gay D.L.   Armstrong G.A.   Armstrong B.M.   Gamble H.S.   Ray S.K.   Maiti C.K.  

Thin Solid Films, Vol. 294, Iss. 1, 1997-02 ,pp. : 149-152

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Raman scattering studies of amorphous Si x Ge 1 - x :H alloy films produced by hot-filament assisted chemical vapour deposition technique

By Kumbhar A.A.   Kshirsagar S.T.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 102-107

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Homogeneous nucleation during crystallization of amorphous silicon produced by low-pressure chemical vapour deposition

By Kahn H.   He A. Q.   Heuer A. H.  

Philosophical Magazine. A. Physics of Condensed Matter. Defects and Mechanical Properties, Vol. 82, Iss. 1, 2002-01 ,pp. : 137-165

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Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

By Aguas H.   Silva V.   Ferreira I.   Fortunato E.   Martins R.  

Philosophical Magazine B, Vol. 80, Iss. 4, 2000-04 ,pp. : 475-486

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