Multichannel process monitor for real-time film thickness and rate measurements in dry etching and deposition

Author： Heinrich F.   Heinze D.   Kowalski T.   Hoffmann P.   Kopperschmidt P.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.51, Iss.4, 1998-12, pp. : 497-502

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