Characterisation of r.f. sputtered tungsten disulfide and oxysulfide thin films

By Martin-Litas I.   Vinatier P.   Levasseur A.   Dupin J.C.   Gonbeau D.   Weill F.  

Thin Solid Films, Vol. 416, Iss. 1, 2002-09 ,pp. : 1-9

Elsevier

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Mechanical properties of r.f. magnetron sputtered indium tin oxide films

By Wu W.-F.   Chiou B.-S.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 244-250

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Characterization of r.f.-sputtered iron oxide films for modeling passive films

By Buchler M.   Virtanen S.   Schmuki P.   Bohni H.   Keranen J.   Stenberg T.   Vuoristo P.   Mantyla T.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 46-60

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The influence of the argon pressure and substrate temperature on the structure of r.F.-sputtered CrNi(65:35), CrNi(50:50) and CrNi(20:80) thin films

By Birjega M.I.   Alexe M.  

Thin Solid Films, Vol. 275, Iss. 1, 1996-04 ,pp. : 152-154

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Annealing effects on the structure and mechanical properties of r.f.-sputtered Cr-B hard thin films

By Zhou M.   Nose M.   Makino Y.   Nogi K.  

Thin Solid Films, Vol. 359, Iss. 2, 2000-01 ,pp. : 165-170

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